Director, CHIPS R&D Metrology Program & Boulder Laboratory, NIST
Marla Dowell is Director of CHIPS R&D Metrology and NIST Boulder Laboratory. Dowell will expand and advance NIST’s efforts to deliver a robust measurement science foundation for the semiconductor industry. Most recently, she served as director of the NIST Communications Technology Laboratory, the leading national laboratory for advanced communications standards and measurements. Dowell began her NIST career as a researcher in the field of optical metrology for photolithography. Her work has enabled better optical measurements for photodynamic therapy to treat cancer, laser safety, communications and manufacturing.
Dowell has served the broader NIST community as a member of the NIST Assessment Review Board, NIST Safety Council, and the NIST People Council. For over 15 years, she has served as a mentor in NIST leadership programs. She has represented NIST on national and international standards committees for optics and photonics as well as external advisory committees on research innovation, photonics, and communications. Dowell has been recognized for her work fostering collaborations and leading high-performance research organizations with numerous awards, including the Department of Commerce Silver Medal, NIST’s Allen V. Astin Award, and the Arthur S. Flemming Award from George Washington University.
Dr. Dowell is a fellow of SPIE, senior member of IEEE, and a member of AAAS, and APS.